Eluent generation not only eliminates the need to handle acids and bases traditionally required for the preparation of IC eluents, it allows chromatographers to run the full range of gradient and isocratic separations more effectively than with hand-made eluents.

Eluent Generation Is the Major Component of Reagent-Free^TM IC systems with Eluent Generation

Eluent generation offers:

• Automatic production of high-purity eluents for isocratic and gradient runs
• Outstanding run-to-run reproducibility week after week
• Elimination of acid and base handling
• Longer lasting pumps because they only encounter deionized water

Automatically Generated Eluents

Eluent generation technology allows automatic production of high-purity IC eluents. Eluent generation prevents baseline shift, increases sensitivity, improves resolution, and ensures consistent peak integration. By eliminating trace contamination in eluents, this technology provides outstanding run-to-run reproducibility, day after day, week after week. The power of Reagent-Free IC systems with Eluent Generation (RFIC-EG^TM systems) extends beyond your laboratory, so your results can be reproduced in other labs as well.

Eluent generation not only eliminates the need to handle acids and bases traditionally required for the preparation of IC eluents, it allows chromatographers to run the full range of gradient and isocratic separations more effectively than with hand-made eluents.

RFIC-EG systems have a mechanical advantage as well. The pump in an RFIC-EG system will have a longer life and require less maintenance. The eluent generator has no moving parts, so you get outstanding eluent concentration reliability, resulting in positive peak identification and excellent reproducibility.

EluGen^® cartridges are available for the generation of of hydroxide (EGC II KOH, NaOH, and LiOH), methanesulfonic acid (EGC II MSA), and carbonate (EGC II K₂CO₃) eluents. Bicarbonate generation requires an electrolytic pH modifier (EPM) in conjunction with the EGC II K₂CO₃ cartridge.